Company Filing History:
Years Active: 2012-2013
Title: Misao Date: Innovator in Substrate Processing Technology
Introduction
Misao Date is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 2 patents, Date has developed innovative methods that enhance the efficiency and reliability of substrate processing apparatuses.
Latest Patents
One of Date's latest patents is a method of operating a substrate processing apparatus. This method addresses the challenges posed by nonfatal failures in the apparatus. It allows for the continuation of certain operations, enabling the cleaning and recovery of substrates without halting the entire apparatus. This innovation significantly reduces the risk of substrates becoming unprocessable. The method involves classifying substrates based on the site of the malfunction and the positions of the substrates within the apparatus. Operations are then carried out for each substrate according to its classification.
Career Highlights
Misao Date is currently employed at Ebara Corporation, where he applies his expertise in substrate processing technology. His work has been instrumental in advancing the capabilities of substrate processing systems. Date's innovative approaches have garnered attention within the industry, showcasing his commitment to improving operational efficiency.
Collaborations
Throughout his career, Date has collaborated with notable colleagues, including Hiroomi Torii and Hiroaki Nishida. These collaborations have contributed to the development of cutting-edge technologies in substrate processing.
Conclusion
Misao Date is a key figure in the field of substrate processing technology, with a focus on enhancing operational efficiency through innovative methods. His contributions continue to shape the industry and improve the reliability of substrate processing apparatuses.