This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Mirta Perlman and Defect-Detection Innovation
Introduction
Mirta Perlman is an inventor associated with Moshave Bet Elazari, Israel, and Applied Materials, Inc. Her patent work addresses methods for detecting defects on substrates, including wafers.
Latest Patents
Perlman is named on one patent: “Multi-Detector Defect Detection System and a Method for Detecting Defects.” The invention describes inspecting a substrate by collecting at least two detection signals, each reflecting light scattered in a distinct direction. It calculates one or more wafer-element attribute values from those signals, compares them with corresponding reference values, and uses the relationship between the values and a threshold to determine whether a defect is present. Perlman’s record lists 1 patent.
Career Highlights
Perlman’s listed patent is connected to her work at Applied Materials, Inc., a company associated with semiconductor manufacturing technologies. The invention focuses on combining signals from multiple detection directions to support substrate inspection.
Collaborations
The supplied information lists Daniel I Some and Evgeni Levin as Perlman’s coworkers. They are associated with her professional context, though the information provided does not specify their roles in the patent.
Conclusion
Mirta Perlman’s patent contribution concerns a multi-detector approach to identifying substrate defects, using scattered-light signals, reference values, and thresholds to support inspection.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile