Mirai Ishida

Title: Mirai Ishida: Innovator in Dielectric and Piezoelectric Technologies

Introduction

Mirai Ishida is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of dielectric and piezoelectric technologies. With a total of two patents to his name, Ishida's work showcases his innovative approach to materials science and engineering.

Latest Patents

Ishida's latest patents include advancements in dielectric thin films and piezoelectric compositions. One of his notable inventions is a dielectric thin film that incorporates a metal oxide, which includes bismuth, sodium, barium, and titanium. This metal oxide features a tetragonal crystal structure with a (100) plane oriented in a normal direction of the dielectric thin film's surface. Additionally, he has developed a piezoelectric composition that includes copper, germanium, and a complex oxide represented by the compositional formula KNbO, which also exhibits a perovskite structure.

Career Highlights

Throughout his career, Ishida has worked with esteemed organizations such as TDK Corporation and the Tokyo Institute of Technology. His experience in these institutions has allowed him to refine his expertise and contribute to groundbreaking research in his field.

Collaborations

Ishida has collaborated with notable colleagues, including Hiroki Katoh and Yuiko Hirose, who have played a role in his innovative projects. Their combined efforts have further advanced the research and development of new technologies.

Conclusion

Mirai Ishida's contributions to dielectric and piezoelectric technologies highlight his role as an influential inventor. His patents reflect a commitment to innovation and excellence in materials science.