This inventor holds 1 USPTO granted patent and 7 published patent applications. Top assignees: Seoul National University, Skhynix Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2026
Title: Minseok Seo - Innovator in Plasma Technology
Introduction
Minseok Seo is an inventor based in Suwon-si, South Korea. He has made significant contributions to the field of plasma technology through his innovative patent applications. Although he currently holds no granted patents, his work demonstrates a commitment to advancing technology in this area.
Latest Patent Applications
Minseok Seo's latest patent applications include two notable inventions. The first is a "PLASMA ETCHING DEVICE AND METHOD OF OPERATING THE SAME." This device features a source power generator that generates a source power signal based on a source control signal. It also includes a bias power generator that produces a bias power signal based on a bias control signal. The device is designed to optimize the etching process by utilizing an inductively-coupled antenna and a wafer support member. The source power generator is capable of detecting the operation of the bias power generator and can perform a frequency switching operation based on this detection.
The second application is for a "MASS FLOW CONTROL DEVICE AND ZERO POINT CALIBRATION METHOD FOR THE SAME." This method involves calibrating the zero point of a mass flow control device by closing a valve in the main flow path to prevent fluid flow. It includes determining whether the fluid has stopped flowing and whether it is stable, based on pressure and flowrate measurements. The calibration value is calculated using temperature and flowrate data, ensuring accurate measurements for the device.
Conclusion
Minseok Seo's innovative work in plasma technology and mass flow control devices showcases his dedication to advancing engineering solutions. His latest patent applications reflect a strong potential for future contributions to the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile