Location History:
- Ibaraki, JP (1995)
- Takatsuki, JP (1998)
- Saitama, JP (1999)
- Osaka, JP (1996 - 2012)
Company Filing History:
Years Active: 1995-2012
Title: Minoru Suezaki: Innovator in Photosensitive Resin Technology
Introduction
Minoru Suezaki is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions and patterned films. With a total of 5 patents to his name, Suezaki continues to push the boundaries of innovation in his industry.
Latest Patents
Suezaki's latest patents include a groundbreaking process for producing patterned films and a novel photosensitive resin composition. The process involves forming a layer of photosensitive resin composition on a substrate and selectively exposing it to light through a mask. This method allows for the creation of a film pattern with protrusions and depressions without the need for traditional development processes. Additionally, the photosensitive resin composition is designed to generate an acid or base upon light irradiation, enhancing its hardening properties.
Career Highlights
Minoru Suezaki is currently employed at Sekisui Chemical Co., Ltd., where he applies his expertise in materials science to develop innovative solutions. His work has been instrumental in advancing the capabilities of photosensitive materials, making them more efficient and versatile for various applications.
Collaborations
Throughout his career, Suezaki has collaborated with notable colleagues, including Kouji Maruyama and Toshiya Sugimoto. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Minoru Suezaki's contributions to the field of photosensitive resin technology exemplify the spirit of innovation. His patents and ongoing work at Sekisui Chemical Co., Ltd. continue to influence the industry and inspire future advancements.