Location History:
- Yamanashi, JP (2007 - 2009)
- Tokyo, JP (2010)
Company Filing History:
Years Active: 2007-2010
Title: Minoru Sakamoto: Innovator in Lithography Technology
Introduction
Minoru Sakamoto is a notable inventor based in Yamanashi, Japan. He has made significant contributions to the field of lithography, holding a total of 3 patents. His work focuses on developing advanced materials and techniques that enhance the performance of lithography masks.
Latest Patents
One of Sakamoto's latest patents is for a lithography mask blank. This innovation involves a lithography mask blank that includes at least one thin film formed on a substrate, which serves a specific function. The blank features a nitrogen-containing thin film and an ammonium ion production preventing layer, designed to prevent the production of ammonium ions during the manufacturing process.
Another significant patent is for a halftone type phase shift mask blank and halftone type phase shift mask. This invention consists of a semitranslucent film pattern and a shielding film pattern on a transparent substrate. The design allows for the detection of these patterns based on the reflected light generated when inspecting light is irradiated on the mask.
Career Highlights
Minoru Sakamoto is currently employed at Hoya Corporation, a leading company in the optical and imaging technology sector. His work at Hoya has positioned him as a key player in the development of innovative lithography solutions.
Collaborations
Sakamoto has collaborated with notable colleagues, including Masao Ushida and Naoki Nishida. These partnerships have contributed to the advancement of lithography technologies and the successful development of his patents.
Conclusion
Minoru Sakamoto's contributions to lithography technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively, paving the way for future innovations.