The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Dec. 24, 2003
Masao Ushida, Tokyo, JP;
Megumi Takeuchi, Tokyo, JP;
Osamu Suzuki, Tokyo, JP;
Minoru Sakamoto, Tokyo, JP;
Masao Ushida, Tokyo, JP;
Megumi Takeuchi, Tokyo, JP;
Osamu Suzuki, Tokyo, JP;
Minoru Sakamoto, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
A lithography mask blank used as a material for producing a lithography mask includes at least one thin film which is formed on a substrate and has a desired function. The blank has a nitrogen-containing thin film as the above-mentioned thin film and an ammonium ion production preventing layer for preventing production of ammonium ions, which is formed on the nitrogen-containing thin film or at least at a surface portion of the nitrogen-containing thin film and which is exposed on the surface of the lithography mask after the lithography mask is manufactured.