Location History:
- Kofu, JP (2007 - 2008)
- Yamanashi, JP (2007 - 2009)
- Tokyo, JP (1986 - 2011)
Company Filing History:
Years Active: 1986-2011
Title: The Innovations of Masao Ushida
Introduction
Masao Ushida is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on photomask technology, which is crucial for the production of semiconductor devices.
Latest Patents
Ushida's latest patents include innovative methods for producing photomask blanks and semiconductor devices. One of his notable inventions is a photomask blank that exhibits excellent flatness when a light-shielding film is patterned. This advancement ensures high mask pattern accuracy and improved pattern transfer accuracy. The photomask blank features a light-shielding film containing chromium on a light-transmitting substrate. Additionally, he has developed a lithography mask blank that incorporates a nitrogen-containing thin film and an ammonium ion production preventing layer, enhancing the functionality of lithography masks.
Career Highlights
Throughout his career, Masao Ushida has worked with notable companies such as Hoya Corporation and Hoyo Corporation. His expertise in photomask technology has positioned him as a key figure in the semiconductor industry. His inventions have paved the way for advancements in lithography and semiconductor manufacturing processes.
Collaborations
Ushida has collaborated with esteemed colleagues, including Masaru Mitsui and Shigekazu Matsui. These partnerships have contributed to the development of innovative technologies in the semiconductor field.
Conclusion
Masao Ushida's contributions to photomask technology and semiconductor devices have established him as a leading inventor in his field. His patents reflect a commitment to innovation and excellence in technology.