Yokohama, Japan

Minoru Nomura

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1976.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Minoru Nomura. Retrieved from https://idiyas.com/inventor/minoru-nomura-hei4n7m1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1976

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1 patent (USPTO):Explore Patents

Title: Minoru Nomura: Innovator in Polymer Technology

Introduction

Minoru Nomura is a distinguished inventor based in Yokohama, Japan. He is known for his contributions to the field of polymer technology, particularly in the development of advanced materials with superior mechanical properties.

Latest Patents

Nomura holds a patent for "Polyethylene-1,2-diphenoxyethane-4,4'-dicarboxylate uniaxially stretched." This innovative patent describes a method for producing films that exhibit excellent dimensional stability and minimal fibrillation tendencies. The process involves stretching a layer of a substantially amorphous polymer at specific temperatures and stretching ratios, resulting in films that can be produced at high speeds while maintaining their mechanical integrity.

Career Highlights

Throughout his career, Minoru Nomura has been associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His work has significantly advanced the understanding and application of polymer materials in various industries.

Collaborations

Nomura has collaborated with notable colleagues, including Mitsuo Kohno and Tsuneo Igarashi. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Minoru Nomura's contributions to polymer technology and his innovative patent demonstrate his commitment to advancing material science. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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