Yokohama, Japan

Minoru Noguchi

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Minoru Noguchi. Retrieved from https://idiyas.com/inventor/minoru-noguchi-vr0p37zx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 48(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Minoru Noguchi: Innovator in Plasma Processing Technology

Introduction

Minoru Noguchi is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique method and apparatus that enhances plasma processing capabilities.

Latest Patents

Minoru Noguchi holds a patent for a "Plasma processing method and apparatus for carrying out the same." This invention involves introducing a processing gas into a processing chamber. It also includes the application of an amplitude modulated or frequency-modulated high-frequency voltage to plasma generating means. This process generates discharge plasma, which is utilized to carry out predetermined processing tasks.

Career Highlights

Minoru Noguchi is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced plasma processing techniques. His contributions have been instrumental in enhancing the efficiency and effectiveness of plasma applications.

Collaborations

Minoru has collaborated with esteemed colleagues such as Toru Otsubo and Susumu Aiuchi. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Minoru Noguchi's contributions to plasma processing technology exemplify the spirit of innovation. His patent and work at Hitachi, Ltd. highlight his commitment to advancing technology in this field. His collaborations further enhance the impact of his inventions, making him a significant figure in the realm of plasma processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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