Kakamigahara, Japan

Minoru Miwa

This inventor holds 1 USPTO granted patent. Top assignee: Kimoto Co, Ltd.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Minoru Miwa. Retrieved from https://idiyas.com/inventor/minoru-miwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Minoru Miwa: Innovator in Reflection Screen Technology

Introduction

Minoru Miwa is a notable inventor based in Kakamigahara, Japan. He has made significant contributions to the field of optical technology, particularly with his innovative reflection screen design. His work has implications for various applications, including enhanced image projection in illuminated environments.

Latest Patents

Miwa holds a patent for a reflection screen and method for producing the same. This reflection screen features a light-reflecting substrate laminated with a light-transmitting polymer layer that contains light absorptive crazes of regular directionality. The unique construction allows for high-contrast images to be projected, maintaining sharpness even in brightly lit areas, such as rooms illuminated by fluorescent lighting.

Career Highlights

Throughout his career, Miwa has been associated with Kimoto Co., Ltd., where he has further developed his expertise in optical technologies. His innovative approach has led to advancements that benefit both commercial and consumer applications.

Collaborations

Miwa has worked alongside talented colleagues, including Akiyoshi Takeno and Satoshi Ako. Their collaborative efforts have contributed to the development of cutting-edge technologies in the field.

Conclusion

Minoru Miwa's contributions to reflection screen technology exemplify the impact of innovation in enhancing visual experiences. His patent reflects a commitment to improving image quality in various lighting conditions, showcasing the importance of inventive solutions in modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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