Minoru Kaneta

Title: Minoru Kaneta: Innovator in Alignment Technology

Introduction

Minoru Kaneta is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of optical alignment technology. His work primarily focuses on enhancing the precision of integrated circuit manufacturing processes.

Latest Patents

Kaneta holds a patent for an alignment device. This device is designed for aligning a reticle and a wafer using a projection lens system. The system projects an integrated circuit pattern from the reticle onto the wafer. A light beam from the wafer passes through the projection lens and is directed by an objective lens to a spatial filter. This filter detects the positional relationship between the reticle and the wafer. The spatial filter is adjusted relative to the optical axis of the objective lens, allowing for the extraction of specific components of the light beam without interference from the objective lens's displacement during alignment operations. He has 1 patent to his name.

Career Highlights

Minoru Kaneta has had a distinguished career at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His innovative work has contributed to advancements in the manufacturing of high-precision optical devices.

Collaborations

Kaneta has collaborated with Ichiro Ishiyama, a fellow innovator in the field. Their partnership has fostered advancements in alignment technologies.

Conclusion

Minoru Kaneta's contributions to alignment technology have made a significant impact in the field of integrated circuit manufacturing. His innovative patent showcases his expertise and dedication to advancing optical precision.