Yokohama, Japan

Minoru Kanda

This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Minoru Kanda. Retrieved from https://idiyas.com/inventor/minoru-kanda-u4ai9bfs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Minoru Kanda: Innovator in Plasma Processing Technology

Introduction

Minoru Kanda is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique matching circuit that enhances the efficiency of plasma processing apparatus.

Latest Patents

Kanda holds a patent for a matching circuit and plasma processing apparatus. This invention provides a matching circuit that achieves a wide range of matching capabilities while stabilizing the matched state against changes in load conditions. The design includes a first variable reactance element connected to an input terminal, with its other terminal linked to a point between two fixed reactance elements. This configuration ensures effective grounding and connection to a stripline, optimizing the performance of the apparatus.

Career Highlights

Minoru Kanda is associated with Matsushita Electric Industrial Co., Ltd., a company renowned for its advancements in electronic technology. His work at Matsushita has been instrumental in pushing the boundaries of plasma processing applications.

Collaborations

Kanda has collaborated with notable colleagues such as Ichiro Nakayama and Yukihiro Maegawa. Their combined expertise has contributed to the successful development of innovative technologies in their field.

Conclusion

Minoru Kanda's contributions to plasma processing technology exemplify the spirit of innovation. His patent reflects a commitment to enhancing the efficiency and stability of electronic systems. His work continues to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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