Beijing, China

Minjiang Fan

This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Chengdu Boe Optoelectronics Technology Co., Ltd.. Active years: 2018.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Minjiang Fan - Innovator in Substrate Cutting Technology

Introduction

Minjiang Fan is a notable inventor based in Beijing, China. He has made significant contributions to the field of substrate cutting technology. His innovative approach has led to the development of a unique substrate cutting system that enhances efficiency and precision in the cutting process.

Latest Patents

Minjiang Fan holds a patent for a substrate cutting system. This system includes a cutting tank, an object stage, a cutter assembly, an injection pump, and a drain pump. The injection pump is designed to inject water into the cutting tank, while the drain pump is responsible for drawing water out. This creates a flowable water environment in the cutting tank, facilitating the cutting of substrates. The object stage serves as a movable base that transports the substrate to be cut into the water environment, where the cutter assembly performs the cutting operation. He has 1 patent to his name.

Career Highlights

Throughout his career, Minjiang Fan has worked with prominent companies in the technology sector. He has been associated with Chengdu Boe Optoelectronics Technology Co., Ltd. and Boe Technology Group Co., Ltd. His experience in these organizations has contributed to his expertise in substrate cutting technology.

Collaborations

Minjiang Fan has collaborated with several professionals in his field. Notable coworkers include Hongyi Li and Junneng Deng, who have worked alongside him on various projects.

Conclusion

Minjiang Fan is a distinguished inventor whose work in substrate cutting technology has made a significant impact. His innovative patent and career achievements reflect his dedication to advancing technology in this area.

Profile summary based on public USPTO records.
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