Pune, India

Mini M Ghosal

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2016.


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Mini M Ghosal: Innovator in Photomask Error Correction

Introduction

Mini M Ghosal is a notable inventor based in Pune, India. He has made significant contributions to the field of photomask error correction, showcasing his expertise and innovative spirit. His work is particularly relevant in the semiconductor industry, where precision is paramount.

Latest Patents

Mini M Ghosal holds a patent for a method of photomask error correction. This invention addresses design errors generated by employing a mask rule check (MRC) program. The automated computer program he developed indexes and examines design errors one by one, utilizing a false error pattern database and a real error pattern database. The program applies waivers to design errors that match patterns in the false error pattern database and modifies errors found in the real error pattern database by substituting error-free patterns. The output includes a list of design errors for which no solution is found.

Career Highlights

Mini M Ghosal is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to work on cutting-edge technologies and contribute to advancements in the semiconductor field. His innovative approach has led to the development of solutions that enhance the accuracy and efficiency of photomask production.

Collaborations

Mini has collaborated with talented coworkers such as Aditya Chaudhary and Ioana C Graur. Their combined expertise fosters a creative environment that drives innovation and problem-solving in their projects.

Conclusion

Mini M Ghosal is a distinguished inventor whose work in photomask error correction exemplifies the importance of innovation in technology. His contributions continue to impact the semiconductor industry positively.

Profile summary based on public USPTO records.
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