This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ccl Manufacturing (Shenzhen) Limited. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Mingleung Li: Innovator in EMC and ESD Technologies
Introduction
Mingleung Li is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of electromagnetic compatibility (EMC) and electrostatic discharge (ESD) technologies. His innovative work has led to the development of a unique motor and ground structure that enhances the stability and performance of EMC and ESD components.
Latest Patents
Mingleung Li holds a patent for a "Motor and ground structure of EMC element and/or ESD element thereof." This invention features a motor and a ground structure designed for EMC and ESD components. The ground structure includes a conductive housing and an insulating cover, which houses the EMC and/or ESD components. A conductive terminal connects to these components, ensuring stable grounding even under conditions of temperature and vibration. This innovative design addresses common challenges faced in the industry, providing a reliable solution for manufacturers.
Career Highlights
Mingleung Li is currently employed at CCL Manufacturing (Shenzhen) Limited, where he continues to develop cutting-edge technologies. His work at CCL has allowed him to collaborate with other talented professionals in the field, further enhancing his expertise and contributions to the industry.
Collaborations
Mingleung Li has worked closely with his coworker, Tao Lin, to advance their projects and share knowledge in the realm of EMC and ESD technologies. Their collaboration has fostered a creative environment that encourages innovation and problem-solving.
Conclusion
Mingleung Li's contributions to EMC and ESD technologies demonstrate his commitment to innovation and excellence in engineering. His patent reflects a deep understanding of the challenges in the field and offers practical solutions that benefit the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile