Ming-Wen Hsiao

Title: The Innovative Contributions of Ming-Wen Hsiao

Introduction

Ming-Wen Hsiao is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding three patents that showcase his expertise and innovative spirit. His work is instrumental in advancing technology in the semiconductor industry.

Latest Patents

Ming-Wen Hsiao's latest patents include methods of manufacturing semiconductor devices. One of his patents describes a process where underlying structures comprising gate electrodes and source/drain epitaxial layers are formed. Subsequently, one or more layers are created over these structures, followed by the formation of a hard mask layer. A groove pattern is then established in the hard mask layer, and one or more first resist layers are applied. A first photo resist pattern is created over these layers, which is used as an etching mask to pattern the first resist layers, resulting in a first hard mask pattern. This patterning process continues with the hard mask layer, leading to the formation of a second hard mask pattern. Another patent outlines a similar method, with an emphasis on adjusting the width of the first photo resist pattern during the process.

Career Highlights

Ming-Wen Hsiao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves developing innovative manufacturing techniques that enhance the efficiency and effectiveness of semiconductor devices. His contributions have been vital in maintaining the company's reputation for excellence in technology.

Collaborations

Ming-Wen Hsiao has collaborated with notable colleagues, including Ming-Feng Shieh and Ming-Jhih Kuo. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Ming-Wen Hsiao's work in semiconductor manufacturing exemplifies the spirit of innovation and collaboration in the technology sector. His patents reflect a deep understanding of the complexities involved in semiconductor device production. Through his contributions, he continues to shape the future of technology in significant ways.