Taoyuan, Taiwan

Ming-Te Shih

This inventor holds 2 USPTO granted patents. Top assignee: Chung-Shan Institute of Science and Technology. Active years: 2004-2006.


% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 1


Location History:

  • Taipei, TW (2004)
  • Tao-Yuan, TW (2006)

Company Filing History:


Years Active: 2004-2006

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ming-Te Shih

Introduction

Ming-Te Shih is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of chemistry, particularly in the development of new synthesis methods and flame-retardant materials. With a total of 2 patents to his name, his work continues to impact various industries.

Latest Patents

Ming-Te Shih's latest patents include a method for the preparation of α,α,α',α'-tetrachloro-p-xylene. This synthesis method involves reacting terephthaldicarboxaldehyde with a mixture of SOCl2 and dimethylformamide (DMF) to produce a product mixture where α,α,α',α'-tetrachloro-p-xylene is the major product. Additionally, 4-dichloromethyl benzaldehyde is generated as a side product, which can be effectively separated using silica column chromatography. Another significant patent involves the development of flame-retardant acrylophosphate derivatives, showcasing his commitment to enhancing material safety.

Career Highlights

Ming-Te Shih is affiliated with the Chung-Shan Institute of Science and Technology, where he applies his expertise in chemistry to advance innovative solutions. His work not only contributes to academic knowledge but also has practical applications in various industries.

Collaborations

Ming-Te Shih has collaborated with esteemed colleagues such as Wen-Chiung Su and Shean-Jeng Jong. These partnerships have fostered a collaborative environment that enhances research and development efforts.

Conclusion

Ming-Te Shih's contributions to the field of chemistry through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to influence the development of safer and more effective materials.

Profile summary based on public USPTO records.
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