Company Filing History:

10 out of 13,713

Applied Materials, Inc.

patents

3 out of 3,777

Lam Research Corporation

patents

Years Active: 2002-2024

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12087561 - Vacuum pump protection against deposition byproduct buildup (2024-09-10),

2. 11710623 - Vacuum pump protection against deposition byproduct buildup (2023-07-25),

3. 11031215 - Vacuum pump protection against deposition byproduct buildup (2021-06-08),

4. 7934979 - Retaining ring with tapered inner surface (2011-05-03),

5. 7678245 - Method and apparatus for electrochemical mechanical processing (2010-03-16),

6. 7677958 - Retaining ring with flange for chemical mechanical polishing (2010-03-16),

7. 7134948 - Magnetically secured retaining ring (2006-11-14),

8. 7101273 - Carrier head with gimbal mechanism (2006-09-05),

9. 7094139 - Retaining ring with flange for chemical mechanical polishing (2006-08-22),

10. 6890249 - Carrier head with edge load retaining ring (2005-05-10),

11. 6835125 - Retainer with a wear surface for chemical mechanical polishing (2004-12-28),

12. 6547641 - Carrier head with a substrate sensor (2003-04-15),

13. 6398621 - Carrier head with a substrate sensor (2002-06-04),

Title: Innovations of Ming-Kuei Tseng

Introduction

Ming-Kuei Tseng is a prominent inventor based in San Jose, California, known for her significant contributions to the field of vacuum technology. With a total of 13 patents to her name, she has made remarkable advancements that enhance the efficiency and functionality of processing chambers used in various industrial applications.

Latest Patents

One of her latest patents focuses on vacuum pump protection against deposition byproduct buildup. This innovation addresses the challenges faced in processing chambers, such as plasma etch chambers, where byproducts from deposition and etch operations can accumulate in the vacuum pump system. The patent describes a vacuum pump system that may include multiple roughing pumps, allowing for the diversion of etch gases and deposition precursors to separate pumps. Additionally, the design incorporates gas ejectors or venturi pumps at the outlet of a primary pump to prevent the formation of deposition byproducts. The system also facilitates cleaning operations, including waferless automated cleaning, using specific clean chemistries to remove byproducts effectively.

Career Highlights

Ming-Kuei Tseng has had a distinguished career, working with leading companies in the semiconductor industry. She has been associated with Applied Materials, Inc. and Lam Research Corporation, where she has contributed her expertise in vacuum technology and processing systems.

Collaborations

Throughout her career, Ming-Kuei has collaborated with notable professionals in her field, including Steven M. Zuniga and Dan A. Marohl. These collaborations have further enriched her work and led to innovative solutions in vacuum technology.

Conclusion

Ming-Kuei Tseng's contributions to vacuum technology and her innovative patents have significantly impacted the semiconductor industry. Her work continues to inspire advancements in processing chamber efficiency and functionality.

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