Ming-Hwu Cheng

Title: The Innovative Contributions of Ming-Hwu Cheng

Introduction

Ming-Hwu Cheng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of sputter coating technology. His work focuses on improving the uniformity of coatings through innovative monitoring methods.

Latest Patents

Ming-Hwu Cheng holds a patent titled "Method for in-situ monitoring layer uniformity of sputter coating based on intensity distribution of plasma spectrum." This invention discloses an in-situ monitoring method on the layer uniformity of sputter coatings in a vacuum chamber based on deconvolution of measuring plasma emission spectra. The method starts from an Ar-normalized Sr intensity distribution derived from deconvoluting the plasma spectra using the Abel inversion method. This distribution is considered the spatial distribution of the sputtering mass of the source target. The thickness profile on the substrate is then calculated using an n-th power of cosine law model. Good agreement was observed between the calculated thickness profile based on spectroscopic measurement and experimental observation. The film uniformity for the same sputter conditions can be monitored by comparing in-situ measurements of Ar-normalized Sr intensity distribution with the standard curve or by directly calculating thickness distribution on the substrates.

Career Highlights

Ming-Hwu Cheng is affiliated with the Precision Instrument Development Center at the National Science Council. His work at this institution has allowed him to focus on advancing technologies related to sputter coatings. His innovative methods have the potential to enhance the quality and efficiency of coating processes in various applications.

Collaborations

Ming-Hwu Cheng has collaborated with notable colleagues such as Jyh-Shin Chen and Py-Shiun Yeh. Their combined expertise contributes to the advancement of research and development in their field.

Conclusion

Ming-Hwu Cheng's contributions to sputter coating technology through his innovative patent demonstrate his commitment to enhancing manufacturing processes. His work continues to influence the industry positively.