Taoyuan, Taiwan

Ming-Huei Chen

This inventor holds 3 USPTO granted patents and 6 published patent applications. Top assignees: Institute of Nuclear Energy Research, Benq Materials Corporation. Active years: 2009-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ming-Huei Chen. Retrieved from https://idiyas.com/inventor/ming-huei-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 33.3

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Bade, TW (2009)
  • Taoyuan County, TW (2009 - 2010)

Company Filing History:


Years Active: 2009-2010

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3 patents (USPTO):Explore Patents

Title: Innovations by Ming-Huei Chen

Introduction

Ming-Huei Chen is an inventor based in Pingzhen City, Taiwan. He has made contributions to the field of materials science, particularly in the development of anti-glare films. His innovative approach focuses on enhancing the optical properties of materials to improve user experience in various applications.

Latest Patent Applications

Ming-Huei Chen's notable patent application is titled "MULTIPLE-COATING PARTICLE AND ANTI-GLARE FILM HAVING THE SAME." This invention relates to a multiple-coating particle and an anti-glare film that incorporates these particles. The anti-glare film consists of a transparent resin and a plurality of multiple-coating particles that are evenly distributed within the resin. The multiple-coating particles are composed of at least two layers of distinct transparent materials, which scatter and refract light due to their different refractive indexes, thereby providing an effective anti-glare effect.

Conclusion

Ming-Huei Chen's work in developing advanced materials for anti-glare applications showcases his innovative spirit and dedication to improving optical technologies. His contributions, although not yet reflected in granted patents, hold promise for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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