Ming-Hsun Kuo

Title: Innovations of Ming-Hsun Kuo

Introduction

Ming-Hsun Kuo is a notable inventor based in Keelung, Taiwan. He has made significant contributions to the field of etching processes, particularly in semiconductor manufacturing. With a total of 2 patents, Kuo's work has advanced the efficiency and effectiveness of etching technologies.

Latest Patents

Kuo's latest patents include a groundbreaking self-cleaning etch process. This innovative process allows for the etching of a substrate within an etching chamber while simultaneously cleaning a thin, non-homogeneous etch residue that accumulates on the surfaces of the chamber's walls and components. The method utilizes a process gas that comprises etchant gas to etch the substrate, which results in the deposition of etch residue inside the chamber. By adding a cleaning gas to the process gas for a sufficient duration and in a high volumetric flow ratio, the method effectively reacts with and removes nearly all the etch residue. This approach advantageously cleans the etch residue during the etching process, eliminating the need for separate cleaning, conditioning, and seasoning steps.

Career Highlights

Ming-Hsun Kuo is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at this organization has allowed him to further develop his innovative ideas and contribute to advancements in semiconductor technology.

Collaborations

Kuo has collaborated with several talented individuals in his field, including Xue-Yu Qian and Zhi-wen Sun. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Ming-Hsun Kuo's contributions to the field of etching processes have made a significant impact on semiconductor manufacturing. His innovative self-cleaning etch process exemplifies his commitment to advancing technology and improving efficiency in the industry.