Ming-Horng Lin

Title: **Inventor Spotlight: Ming-Horng Lin**

Introduction

Ming-Horng Lin, an innovative inventor based in Hsinchu, Taiwan, has made notable contributions to the field of semiconductor technology. With a focus on enhancing fabrication methods, Lin's inventive work has garnered attention for its practical applications in the industry.

Latest Patents

Lin holds a patent for "Deep trench bottle-shaped etching using Cl2 gas," which introduces a method to fabricate bottle-shaped deep trenches into semiconductor substrates. This innovative process involves the use of chlorine gas at a carefully controlled flow rate within an etching plasma composition. The method allows for an increase in the width of the trench's lower portion by 100%, while minimizing adverse side effects such as polymer deposition often associated with higher flow rates of certain gases. The etching compositions used in this method include precise flow rates of HBr, NF3, and He/O2, ensuring optimal results.

Career Highlights

Throughout his career, Lin has demonstrated a commitment to advancing semiconductor fabrication technologies. His patent reflects a deep understanding of chemical processes involved in etching, which is crucial for the production of modern electronic devices. Lin’s expertise in the field, alongside his innovative thinking, has positioned him as a valuable contributor to advancements in semiconductor manufacturing.

Collaborations

In his professional journey, Ming-Horng Lin has collaborated with esteemed colleagues such as Ray C. Lee and Nien-Yu Tsai. Together, they have worked on various projects that harness their collective skills and knowledge in semiconductor technology, further pushing the boundaries of what is possible in this dynamic field.

Conclusion

Ming-Horng Lin stands out as a prominent inventor with a significant contribution to semiconductor technology through his patent for deep trench etching methods. His innovative approach not only enhances production capabilities but also sets a precedent for future advancements in the industry. As the field continues to evolve, Lin's work will undoubtedly influence the next generation of semiconductor fabrication techniques.