Ming-Fea Chow

Title: The Innovations of Ming-Fea Chow

Introduction

Ming-Fea Chow is a notable inventor based in Poughquag, NY (US). He has made significant contributions to the field of lithographic materials and processes, holding a total of 6 patents. His work focuses on enhancing the performance and stability of photoresist systems used in various imaging applications.

Latest Patents

Chow's latest patents include a process for making diazoquinone sensitized polyamic acid. This innovation reduces the dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems, allowing for the preparation of relief images with fine line resolution. By reducing the acidity of the polyamic acid prior to exposure, the effectiveness of the photoresist is significantly improved. Another notable patent involves thermally stable photoresists with high sensitivity. This invention discloses specific lithographic polymeric materials that possess acid labile or photolabile groups. These materials are transparent to deep UV radiation, enabling deep UV imaging while maintaining thermal stability at elevated temperatures. The resists exhibit unexpectedly high thermal stability, making them suitable for use in bilayer resist processes.

Career Highlights

Throughout his career, Ming-Fea Chow has worked with prominent companies, including IBM. His expertise in the field has allowed him to develop innovative solutions that address the challenges faced in lithography and imaging technologies.

Collaborations

Chow has collaborated with notable individuals such as Carlton G Willson and Kaolin N Chiong. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Ming-Fea Chow's contributions to the field of lithographic materials and processes have established him as a significant inventor. His innovative patents continue to influence the industry and enhance imaging technologies.