Company Filing History:
Years Active: 2020
Title: The Innovative Contributions of Ming Fang
Introduction
Ming Fang is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of photolithography through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of optical masks used in various applications.
Latest Patents
Ming Fang holds a patent for an "Optical mask for use in a photolithography process, a method for fabricating the optical mask, and a method for fabricating an array of patterns on a substrate using the optical mask." This invention includes an array of microstructures disposed on a mask substrate, which transforms a uniform optical exposure passing through it into an array of optical exposure patterns. This advancement is crucial for improving the precision of pattern fabrication in semiconductor manufacturing.
Career Highlights
Ming Fang is affiliated with the City University of Hong Kong, where he contributes to research and development in optical technologies. His expertise in photolithography has positioned him as a key figure in the academic and technological community.
Collaborations
Ming Fang has worked alongside esteemed colleagues such as Johnny Chung Yin Ho and Lei Shu. Their collaborative efforts have furthered advancements in optical technologies and photolithography processes.
Conclusion
Ming Fang's innovative work in photolithography and his patent contributions highlight his importance in the field of optical technologies. His dedication to research and collaboration continues to influence advancements in this critical area of technology.