The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Aug. 24, 2017
Applicant:
City University of Hong Kong, Kowloon, HK;
Inventors:
Assignee:
City University of Hong Kong, Kowloon, HK;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); G03F 7/0002 (2013.01); G03F 7/0015 (2013.01); G03F 7/70275 (2013.01); G03F 7/70283 (2013.01);
Abstract
An optical mask for use in a photolithography process, a method for fabricating the optical mask, and a method for fabricating an array of patterns on a substrate using the optical mask, wherein the optical mask includes an array of microstructures disposed on a mask substrate, and wherein the array of microstructures is arranged to transform a uniform optical exposure passing therethrough to an array of optical exposure patterns.