Company Filing History:
Years Active: 2020
Title: Lei Shu - Innovator in Photolithography Technology
Introduction
Lei Shu is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of photolithography, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of optical masks used in various applications.
Latest Patents
Lei Shu holds a patent for an "Optical mask for use in a photolithography process, a method for fabricating the optical mask, and a method for fabricating an array of patterns on a substrate using the optical mask." This invention involves an optical mask that includes an array of microstructures on a mask substrate. The design is intended to transform a uniform optical exposure passing through it into an array of optical exposure patterns, thereby improving the photolithography process.
Career Highlights
Lei Shu is affiliated with the City University of Hong Kong, where he continues to advance his research and development in photolithography technology. His work has garnered attention for its potential applications in various industries, including semiconductor manufacturing and materials science.
Collaborations
Lei has collaborated with notable colleagues, including Johnny Chung Yin Ho and Ming Fang, who contribute to his research endeavors. Their combined expertise enhances the innovative potential of their projects.
Conclusion
In summary, Lei Shu is a key figure in the field of photolithography, with a focus on developing advanced optical masks. His contributions are paving the way for future innovations in this critical area of technology.