This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations of Ming-Fa Wu in Semiconductor Technology
Introduction
Ming-Fa Wu is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to atomic layer deposition.
Latest Patents
Ming-Fa Wu holds a patent for an "Atomic layer deposition tool and method." This invention involves a method of forming a semiconductor device that includes several key steps. It begins with forming a hydrophobic coating on an inner surface of an exhaust line, which is connected to a semiconductor processing chamber. The process continues with the introduction of a first precursor and a second precursor into the chamber. These precursors react to form a layer of oxide material. Finally, the precursors are pumped from the chamber through the exhaust line. This innovative method enhances the efficiency and effectiveness of semiconductor device fabrication.
Career Highlights
Ming-Fa Wu is associated with Taiwan Semiconductor Manufacturing Co., Ltd., a leading company in the semiconductor industry. His work at this esteemed organization has allowed him to contribute to cutting-edge technologies and advancements in semiconductor manufacturing.
Collaborations
Ming-Fa Wu collaborates with fellow inventor Wen-Ju Chen, further enhancing the innovative capabilities within their field.
Conclusion
Ming-Fa Wu's contributions to semiconductor technology through his patent on atomic layer deposition exemplify the importance of innovation in advancing the industry. His work continues to influence the development of efficient semiconductor devices.