Minah Kim

Title: Minah Kim: Innovator in Lithographic Mask Fabrication

Introduction

Minah Kim is a notable inventor based in Hwaseong, South Korea. She has made significant contributions to the field of lithography, particularly in the development of mask process correction methods. Her innovative work has implications for the semiconductor manufacturing industry.

Latest Patents

Minah Kim holds a patent for "Mask process correction methods and methods of fabricating lithographic masks using the same." This patent outlines methods for fabricating lithographic masks that include performing mask process correction (MPC) on a mask tape out (MTO) design layout. The process involves identifying a plurality of unit cells, each containing various curve patterns, and applying model-based MPC on at least one of these unit cells. Additionally, the methods include performing electron beam exposure based on the MTO design layout after the MPC has been applied.

Career Highlights

Minah Kim is currently employed at Samsung Electronics Ltd., where she continues to advance her research and development efforts in lithography. Her work is crucial in enhancing the precision and efficiency of semiconductor manufacturing processes.

Collaborations

Minah collaborates with her coworker, Soeun Shin, who also contributes to the innovative projects at Samsung Electronics Ltd. Their teamwork exemplifies the collaborative spirit in research and development.

Conclusion

Minah Kim's contributions to lithographic mask fabrication through her patented methods highlight her role as an influential inventor in the semiconductor industry. Her work not only advances technology but also sets a foundation for future innovations in the field.