Yokohama, Japan

Mina Nomura

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Mitsubishi Rayon Company, Limited. Active years: 2011.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Mina Nomura: Innovator in Coating Technology

Introduction

Mina Nomura is a prominent inventor based in Yokohama, Japan. She has made significant contributions to the field of coating technology, particularly through her innovative patent. Her work focuses on enhancing the performance and durability of coatings used in various applications.

Latest Patents

Mina Nomura holds a patent for a coating, aqueous coating material, and process for producing a coating using the same. The patent describes a coating that comprises a polymer-containing coating component and colloidal silica with an average particle diameter of 60 nm or less. The formulation includes 0.5 to 20 parts by mass of colloidal silica per 100 parts by mass of polymer. This unique coating exhibits excellent antifouling performance, along with superior transparency, weather resistance, water resistance, and elongation degree.

Career Highlights

Mina Nomura is associated with Mitsubishi Rayon Company, Limited, where she has been instrumental in developing advanced coating solutions. Her innovative approach has led to significant advancements in the industry, showcasing her expertise and dedication to her field.

Collaborations

Mina has collaborated with notable colleagues, including Hiroki Ishii and Motomi Tanaka. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Mina Nomura's contributions to coating technology highlight her role as a leading inventor in her field. Her patent reflects her commitment to developing high-performance materials that meet the demands of modern applications.

Profile summary based on public USPTO records.
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