This inventor holds 3 USPTO granted patents and 3 EPO patents. Top assignee: Kolon Industries, Inc.. Active years: 2025-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025-2026
Title: Min-Woo Nam: Innovator in Cut Resistant Polyethylene Yarn
Introduction
Min-Woo Nam is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of materials science, particularly in the development of protective textiles. His innovative work focuses on enhancing the durability and safety of protective articles through advanced materials.
Latest Patents
Min-Woo Nam holds a patent for a "Cut resistant polyethylene yarn, method for manufacturing the same, and protective article produced using the same." This patent describes a polyethylene yarn that enables the production of protective articles capable of providing excellent wearability while maintaining high cut resistance. The method for manufacturing this yarn is also detailed, showcasing its potential applications in various protective gear.
Career Highlights
Nam is currently employed at Kolon Industries, Inc., a leading company in the textile and materials industry. His work at Kolon Industries has allowed him to focus on innovative solutions that address the growing demand for high-performance protective materials. His dedication to research and development has positioned him as a key player in the field.
Collaborations
Throughout his career, Min-Woo Nam has collaborated with notable colleagues, including Young-Soo Lee and Sang-Mok Lee. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Min-Woo Nam's contributions to the field of protective materials through his innovative polyethylene yarn patent exemplify his commitment to enhancing safety and performance in protective articles. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
