logo

For the Inventor, By the Inventor

Daejeon, South Korea

Min Suk Cha

This inventor holds 2 USPTO granted patents. Top assignee: Korea Institute of Machinery & Materials. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min Suk Cha. Retrieved from https://idiyas.com/inventor/min-suk-cha-kdhx1q4h

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal2 out of 366 
 
Korea Institute of Machinery & Materials
 patents

Years Active: 2013

Loading Chart...
2 patents (USPTO):Explore Patents
1. 8568662 - Plasma reaction apparatus, plasma reaction method using the same, plasma reaction method of persistent gas, and apparatus for decreasing NOx by occlusion catalyst (2013-10-29),
2. 8524162 - Plasma reaction, apparatus for decreasing NOx by occlusion catalyst using the same (2013-09-03),

Title: Min Suk Cha: Innovator in Plasma Reaction Technology

Introduction

Min Suk Cha is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of plasma reaction technology, focusing on methods and apparatuses that enhance fuel reforming and reduce harmful emissions.

Latest Patents

Min Suk Cha holds 2 patents related to plasma reaction technology. His latest patents include a plasma reaction apparatus and a plasma reaction method that utilizes rotating arc plasma. These inventions aim to improve the chemical treatment of persistent gases and decrease nitrogen oxides (NOx) emissions through an occlusion catalyst. The plasma reaction apparatus allows raw materials to flow in a swirling motion, ensuring efficient reactions within a confined plasma space. This innovative design expands the plasma reaction zone, enhancing the overall effectiveness of the process.

Career Highlights

Min Suk Cha is affiliated with the Korea Institute of Machinery and Materials, where he continues to advance research in plasma technology. His work has garnered attention for its potential applications in environmental protection and energy efficiency.

Collaborations

Some of his notable coworkers include Dae Hoon Lee and Kwan Tae Kim, who contribute to the collaborative efforts in their research projects.

Conclusion

Min Suk Cha's innovative work in plasma reaction technology showcases his commitment to addressing environmental challenges through advanced engineering solutions. His contributions are paving the way for more sustainable industrial practices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…