Taoyuan, Taiwan

Min-Si Yan

This inventor holds 1 USPTO granted patent. Top assignee: Far Eastern New Century Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min-Si Yan. Retrieved from https://idiyas.com/inventor/min-si-yan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Min-Si Yan: Innovator in Wearable Technology

Introduction

Min-Si Yan is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of wearable technology, particularly with his innovative designs that enhance user interaction and experience.

Latest Patents

Min-Si Yan holds a patent for a "Wearable action-aware device." This device includes a clothing body, a signal receiving and computing element, and a conductive line made of conductive fabric. The conductive line is electrically connected to the signal receiving and computing element, forming a circuit that is integrated into the clothing. This design allows for the measurement of action information when the user wears the device, making it a valuable tool for various applications.

Career Highlights

Min-Si Yan is currently employed at Far Eastern New Century Corporation, where he continues to develop innovative solutions in wearable technology. His work has garnered attention for its practicality and potential impact on the industry.

Collaborations

Min-Si Yan collaborates with talented coworkers, including Chih-Ting Li and Yueh-Hsien Lin. Their combined expertise contributes to the advancement of technology within their organization.

Conclusion

Min-Si Yan's contributions to wearable technology exemplify the innovative spirit of modern inventors. His patent for the wearable action-aware device showcases his commitment to enhancing user experience through technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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