Hsinchu, Taiwan

Min-Lung Hsieh

This inventor holds 1 USPTO granted patent. Top assignee: Industrial Technology Research Institute. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min-Lung Hsieh. Retrieved from https://idiyas.com/inventor/min-lung-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2007

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Min-Lung Hsieh: Innovator in Luminaire Technology

Introduction

Min-Lung Hsieh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of luminaire technology, particularly with his innovative designs that enhance light distribution and reduce glare.

Latest Patents

Hsieh holds a patent for a "Reflector with Negative Focal Length." This invention involves a luminaire that includes a light source and a unique reflector capable of reflecting upward-incident rays emitted from the light source. The design also features a side screen that reflects sideward-incident rays and a plate with micro-structures that diffuse light effectively. This innovative luminaire screen allows for a broader angle of light discharge, significantly reducing glare.

Career Highlights

Min-Lung Hsieh is associated with the Industrial Technology Research Institute, where he has been instrumental in advancing luminaire technology. His work focuses on creating efficient lighting solutions that cater to modern needs.

Collaborations

Hsieh has collaborated with notable colleagues, including Jian-Shian Lin and Hsiu-Chen Hsu, contributing to various projects that enhance the functionality and efficiency of lighting systems.

Conclusion

Min-Lung Hsieh's contributions to luminaire technology through his innovative patent demonstrate his commitment to improving lighting solutions. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…