Min-jae Chung

Title: The Innovative Contributions of Min-jae Chung in Layer-by-Layer Etching Technology

Introduction

Min-jae Chung, a prominent inventor based in Bucheon, South Korea, has made significant advancements in the field of etching technology. With a total of three patents to his name, his inventions reflect a deep commitment to improving precision and efficiency in material processing.

Latest Patents

Chung's latest patents include groundbreaking developments, such as the "Layer-by-layer etching apparatus using neutral beam and method of etching using the same." This invention facilitates atomic-level control during the etching process by precisely managing the supply of etching gas and the irradiation of a neutral beam. The method allows for the minimal etching damage to the material layer, offering substantial improvements in the fabrication of microdevices.

Another remarkable patent is the "Etching apparatus using neutral beam," which presents a damage-free solution for large-area etching. This innovative apparatus employs a neutral beam, avoiding electrical and physical damage during the process. It comprises several essential components, including an ion source, a grid with multiple holes for ion beam passage, and a reflector for neutralizing the ion beam, ensuring an efficient and safe etching experience.

Career Highlights

Min-jae Chung is affiliated with Sungkyunkwan University, where he continues to contribute to the advancement of etching technologies. His work is pivotal in the field, helping to push the boundaries of precision processing in semiconductor manufacturing and other applications.

Collaborations

Throughout his career, Chung has collaborated with notable colleagues, including Geun-Young Yeom and Do-haing Lee. These partnerships have further enhanced the quality and impact of his research, leading to innovative solutions in the field of material etching.

Conclusion

Min-jae Chung's contributions to layer-by-layer etching technology demonstrate his ingenuity and dedication as an inventor. With his patented inventions, he has paved the way for more efficient and precise etching processes, significantly impacting various technological fields. His commitment to innovation marks him as a significant figure in contemporary etching technology.