Hwaseong-si, South Korea

Min Hee Park

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min Hee Park. Retrieved from https://idiyas.com/inventor/min-hee-park-75d3wmi4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.5

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Min Hee Park: Innovator in Display Technology

Introduction

Min Hee Park is a notable inventor based in Hwaseong-si, South Korea. He is recognized for his contributions to display technology, particularly in the development of innovative display devices. His work has significantly impacted the field, showcasing his expertise and creativity.

Latest Patents

Min Hee Park holds a patent for a display device and method for providing the same. This invention includes a substrate with a bending area and a flat area, along with a display unit and a support layer. The design allows for flexibility and functionality, making it a valuable advancement in display technology.

Career Highlights

Min Hee Park is currently employed at Samsung Display Co., Ltd., where he continues to push the boundaries of display innovation. His work at this leading company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of Min Hee Park's coworkers include Han Ho Park and Eui Jeong Kang. Their collective efforts contribute to the advancement of display technologies at Samsung Display Co., Ltd.

Conclusion

Min Hee Park is a distinguished inventor whose work in display technology exemplifies innovation and creativity. His contributions continue to shape the future of display devices, making a lasting impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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