Seongnam, South Korea

Min Chul Park

This inventor holds 1 USPTO granted patent. Top assignee: Tme Therapeutics Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min Chul Park. Retrieved from https://idiyas.com/inventor/min-chul-park-zn3em4bi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Min Chul Park: Innovator in Surfactant Adhesive Technology

Introduction

Min Chul Park is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of adhesive technology, particularly through his innovative patent related to surfactant adhesive compositions.

Latest Patents

Min Chul Park holds a patent for a surfactant adhesive composition. This invention provides a surfactant adhesive protein that comprises an amphiphilic peptide. The adhesive protein is designed to enhance the dispersion of hydrophilic or hydrophobic particles in various solvents. It utilizes the strong adhesive properties of mussel adhesive proteins, making it suitable for applications requiring antibacterial or antiviral functions, as well as cosmetic products and inks.

Career Highlights

Min Chul Park is associated with Tme Therapeutics Co., Ltd., where he continues to develop innovative solutions in adhesive technology. His work has garnered attention for its potential applications in various industries.

Collaborations

Some of his notable coworkers include Sang Jae Lee and Bong Jin Hong, who contribute to the collaborative efforts at Tme Therapeutics Co., Ltd.

Conclusion

Min Chul Park's contributions to surfactant adhesive technology highlight his innovative spirit and dedication to advancing the field. His patent reflects a significant step forward in adhesive applications, showcasing the potential for future developments in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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