Lexington, MA, United States of America

Milton S Dietz


Average Co-Inventor Count = 1.2

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1979-1984

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Milton S. Dietz

Introduction

Milton S. Dietz is a notable inventor based in Lexington, MA, who has made significant contributions to the field of optical technology. With a total of three patents to his name, Dietz has developed innovative methods and apparatuses that enhance the evaluation of spectral data in various applications.

Latest Patents

One of Dietz's latest patents is a method and apparatus for simultaneously evaluating different spectral zones. This invention allows for the control of exposure by evaluating scene radiation in a spectrally distinct manner from different zones, thereby defining exposure based on selected frequencies. Another significant patent is an apparatus for varying the spectral filter over a photocell. This device automatically adjusts the positioning of an infrared filter relative to a light-sensing photocell in an exposure control system. It effectively manages light passage under varying ambient conditions, ensuring optimal exposure whether in high or low light situations.

Career Highlights

Dietz has spent a considerable part of his career at Polaroid Corporation, a company renowned for its innovations in imaging technology. His work has contributed to advancements in exposure control systems, which are crucial for capturing high-quality images.

Collaborations

Throughout his career, Dietz has collaborated with various professionals, including his coworker William J. McCune, Jr. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the field.

Conclusion

Milton S. Dietz's contributions to optical technology through his patents and work at Polaroid Corporation highlight his role as a significant inventor in the industry. His innovative methods and apparatuses continue to influence the way we evaluate and control exposure in imaging systems.

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