Mountain View, CA, United States of America

Miles Dudman

USPTO Granted Patents = 2 

Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011-2014

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2 patents (USPTO):Explore Patents

Title: Miles Dudman: Innovator in Semiconductor Fabrication

Introduction

Miles Dudman is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor fabrication, holding 2 patents that focus on advanced process control methodologies.

Latest Patents

His latest patents include a "System for improved pressure control in horizontal diffusion furnace scavenger system for controlling oxide growth." This invention relates to semiconductor wafer fabrication and aims to enhance oxide formation control using pressure stabilization systems. The system dynamically adjusts scavenger pressure in a furnace during wafer fabrication, ensuring optimal conditions for oxide growth.

Another significant patent is the "System and method for matching silicon oxide thickness between similar process tools." This invention outlines a method for fabricating semiconductors that improves oxide thickness control. It involves defining a process tool, evaluating performance variables, and modifying control of the process tool based on determined results. This innovation offers advantages in reducing engineering time, enhancing process controls, and improving cycle times.

Career Highlights

Miles Dudman is currently employed at Micrel, Incorporated, where he applies his expertise in semiconductor technologies. His work has contributed to advancements in the industry, particularly in improving fabrication processes.

Collaborations

One of his notable coworkers is Andrew V Le, with whom he collaborates on various projects within the semiconductor field.

Conclusion

Miles Dudman's contributions to semiconductor fabrication through his innovative patents demonstrate his commitment to advancing technology in this critical industry. His work continues to influence the efficiency and effectiveness of semiconductor manufacturing processes.

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