Milan R Kirs

Title: Milan R Kirs: Innovator in Magnetron Sputtering Technology

Introduction

Milan R Kirs is a notable inventor based in Lafayette, CA (US). He has made significant contributions to the field of magnetron sputtering technology, holding 2 patents that enhance the efficiency and effectiveness of sputtering devices.

Latest Patents

Kirs' latest patents include a "Planar Magnetron Sputtering Apparatus" and a "Cylindrical Magnetron Shield Structure." The planar magnetron sputtering device features improved target utilization and cooling capacity. It incorporates a magnet yoke made of low carbon steel, which provides both magnetic shunt and physical strength. The design allows for a closed-loop magnetic field over the target's lower surface, enhancing film uniformity during deposition. The cylindrical magnetron shield structure is designed to prevent arcing during the sputtering of certain materials, particularly dielectrics. This innovative shield is rotatable, allowing for selective positioning of the sputtering activity.

Career Highlights

Milan R Kirs is associated with The Boc Group, Inc., where he continues to develop advanced sputtering technologies. His work has significantly impacted the efficiency of sputtering processes in various applications.

Collaborations

Kirs has collaborated with notable colleagues, including Abraham I Belkind and J Randall Kurie, contributing to the advancement of magnetron sputtering technology.

Conclusion

Milan R Kirs is a distinguished inventor whose work in magnetron sputtering technology has led to innovative solutions that improve target utilization and film uniformity. His contributions continue to influence the field positively.