Turku, Finland

Mikko T Hautala

This inventor holds 1 USPTO granted patent. Top assignee: Nokia Technologies Oy. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mikko T Hautala. Retrieved from https://idiyas.com/inventor/mikko-t-hautala

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2017

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Mikko T Hautala: Innovator in Optical Aberration Compensation

Introduction

Mikko T Hautala is a notable inventor based in Turku, Finland. He has made significant contributions to the field of optical technology, particularly in the compensation of optical aberrations caused by non-planar windows. His innovative approach has implications for electronic devices and camera systems.

Latest Patents

Hautala holds a patent for "Compensation of optical aberrations caused by non-planar windows." This patent presents a new apparatus designed to correct optical aberrations that arise from non-planar surfaces, such as curved windows. The invention utilizes a diffractive optical element, like a diffractive foil, to enhance image quality in electronic devices with displays. The technology aims to minimize aberrations to meet predefined parameters, ensuring clearer and more accurate image capture.

Career Highlights

Mikko T Hautala is associated with Nokia Technologies Oy, where he applies his expertise in optical technologies. His work focuses on developing solutions that enhance the performance of electronic devices and cameras. Hautala's innovative contributions have positioned him as a key figure in the advancement of optical technology.

Collaborations

Hautala has collaborated with notable colleagues, including Marko Parikka and Antti I Wright. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Mikko T Hautala's work in optical aberration compensation showcases his commitment to advancing technology in electronic devices. His patent reflects a significant step forward in improving image quality, demonstrating the impact of innovative thinking in the field of optics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…