This inventor holds 1 USPTO granted patent. Top assignee: Nihon New Chrome Co., Ltd.. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Mikiya Tajima: Innovator in Copper-Tin Alloy Plating
Introduction
Mikiya Tajima is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of plating technology, particularly in the development of cyanogen-free copper-tin alloy plating methods. His innovative approach has the potential to enhance industrial applications in this area.
Latest Patents
Mikiya Tajima holds a patent for a "Pyrophosphoric acid bath for use in copper-tin alloy plating." This invention relates to a pyrophosphoric acid bath that contains an additive composed of an amine derivative, an epihalohydrin, and a glycidyl ether compound. The ratios of epihalohydrin to glycidyl ether compound are maintained between 0.5–2 to 0.1–5 on a molar basis, per 1 mol of the amine derivative. The bath has a pH of 3 to 9 and may optionally include an additive composed of an organic sulfonic acid and/or an organic sulfonic acid salt. This invention provides a method for uniform treatment in copper-tin alloy plating, capable of minimizing defective product generation rates even with fluctuating current densities.
Career Highlights
Mikiya Tajima is associated with Nihon New Chrome Co., Ltd., where he applies his expertise in plating technology. His work focuses on developing innovative solutions that meet industrial standards and improve production efficiency.
Collaborations
Mikiya has collaborated with notable colleagues such as Kazuya Urata and Naoyuki Oniwa. Their combined efforts contribute to advancements in the field of plating technology.
Conclusion
Mikiya Tajima's contributions to the development of cyanogen-free copper-tin alloy plating highlight his innovative spirit and dedication to improving industrial processes. His patent reflects a significant advancement in the field, showcasing the potential for enhanced efficiency and reduced defects in plating applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile