Location History:
- Kumagaya, JP (2004)
- Tokyo, JP (2023)
Company Filing History:
Years Active: 2004-2023
Title: Mikio Ushijima: Innovator in Substrate Bonding and Microlithography
Introduction
Mikio Ushijima is a prominent inventor based in Kumagaya, Japan. He has made significant contributions to the fields of substrate bonding and microlithography. With a total of 2 patents to his name, Ushijima's work focuses on improving the efficiency and accuracy of manufacturing processes.
Latest Patents
Ushijima's latest patents include a substrate bonding apparatus and method aimed at enhancing the throughput of substrate bonding. This innovative apparatus bonds first and second substrates, creating contact regions that enlarge from specific parts of the substrates. The apparatus features a detecting unit that gathers information about these contact regions and a determining unit that assesses whether the bonding process can proceed based on the detected information.
Another notable patent involves a reticle-focus detector and charged-particle-beam microlithography apparatus. This invention addresses the challenges posed by the bending and flexing of reticles used in microlithography, which can lead to errors in image focus and magnification. The apparatus monitors changes in the axial height position of the reticle, allowing for real-time adjustments to maintain focus and accuracy during the lithography process.
Career Highlights
Mikio Ushijima is currently employed at Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has allowed him to develop cutting-edge technologies that enhance manufacturing processes in various industries.
Collaborations
Ushijima has collaborated with notable colleagues, including Kazuaki Suzuki and Isao Sugaya. Their combined expertise has contributed to the advancement of innovative solutions in their respective fields.
Conclusion
Mikio Ushijima's contributions to substrate bonding and microlithography demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in these fields and a dedication to developing effective solutions.