Ehime, Japan

Mikio Deguchi

This inventor holds 1 USPTO granted patent. Top assignees: Three Tec Co., Ltd., Youth Engineering Co., Ltd. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mikio Deguchi. Retrieved from https://idiyas.com/inventor/mikio-deguchi-8a3f8n1j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Mikio Deguchi: Innovator in Plasma Technology

Introduction

Mikio Deguchi is a notable inventor based in Ehime, Japan. He has made significant contributions to the field of plasma technology, particularly through his innovative patent that addresses the processing of various compounds.

Latest Patents

Mikio Deguchi holds a patent for an "Object processing apparatus and plasma facility comprising the same." This processing apparatus utilizes a high voltage electrode and a ground electrode to generate plasma under atmospheric pressure within a reaction passage. The design allows for effective decomposition of fluorocompounds, such as PFCs, by ensuring that these compounds come into contact with plasma for a sufficient duration in a compact space. The apparatus features a small and simple structure, making it suitable for integration into various process chambers.

Career Highlights

Throughout his career, Mikio has worked with several companies, including Three Tec Co., Ltd. and Youth Engineering Co., Ltd. His experience in these organizations has contributed to his expertise in plasma technology and innovation.

Collaborations

Mikio has collaborated with notable individuals in his field, including Ryohei Itatani and Bencherki Mebarki. These partnerships have likely enhanced his work and contributed to advancements in plasma processing technologies.

Conclusion

Mikio Deguchi's contributions to plasma technology through his innovative patent demonstrate his commitment to advancing the field. His work not only showcases his inventive spirit but also highlights the potential for practical applications in various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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