Yokohama, Japan

Miki Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Miki Tanaka. Retrieved from https://idiyas.com/inventor/miki-tanaka-gjixmp3d

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Miki Tanaka - Innovator in Steganography

Introduction

Miki Tanaka is a prominent inventor based in Yokohama, Japan. She has made significant contributions to the field of steganography, particularly through her innovative patent that enhances the extraction of watermarks from images.

Latest Patents

Miki Tanaka holds a patent for a "Steganographic system, method, program and storage medium therefor." This invention provides a steganographic system that eliminates the need for an original image during the extraction of watermarks. It determines the optimal position for embedding watermark information in an image, ensuring that picture quality remains intact while effectively embedding and extracting watermark information.

Career Highlights

Miki Tanaka is associated with Hitachi, Ltd., a leading technology company known for its advancements in various fields. Her work at Hitachi has allowed her to focus on innovative solutions in digital image processing and security.

Collaborations

Throughout her career, Miki has collaborated with notable colleagues, including Yutaka Kurosu and Tomoyuki Kaji. These collaborations have contributed to the development of cutting-edge technologies in her field.

Conclusion

Miki Tanaka's contributions to steganography exemplify her innovative spirit and dedication to advancing technology. Her work continues to influence the way digital information is secured and processed.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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