Miki Shibata

Title: Miki Shibata - Innovator in Polishing Technology

Introduction

Miki Shibata is a notable inventor based in Fujisawa, Japan. She has made significant contributions to the field of polishing technology, particularly in the semiconductor industry. With a total of 2 patents to her name, Shibata's work focuses on enhancing the efficiency and safety of polishing processes.

Latest Patents

Shibata's latest patents include an innovative polishing apparatus designed for achieving a flat mirror finish on workpieces such as semiconductor wafers. This apparatus features a polishing section for the actual polishing process and a cleaning section for maintaining the cleanliness of the polished workpiece. It is equipped with a first liquid leakage sensor in the polishing section and a second sensor in the cleaning section. These sensors detect any liquid leakage that may occur, allowing for immediate action. The apparatus also includes a controlling device that stops the supply of liquid to the affected section when a leak is detected, ensuring both safety and efficiency in the polishing process.

Career Highlights

Miki Shibata is currently employed at Ebara Corporation, a leading company in the field of precision equipment and technology. Her work at Ebara has allowed her to develop and refine her innovative polishing apparatus, contributing to advancements in semiconductor manufacturing.

Collaborations

Throughout her career, Shibata has collaborated with talented individuals such as Toyomi Nishi and Hidetaka Nakao. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in the polishing sector.

Conclusion

Miki Shibata's contributions to polishing technology have made her a key figure in the semiconductor industry. Her innovative patents and collaborative efforts continue to drive advancements in this critical field.