Company Filing History:
Years Active: 2000-2001
Title: **Miki Kobayashi: Innovator in Photoresist Technology**
Introduction
Miki Kobayashi is a prominent inventor based in Chiba, Japan, known for her contributions to the field of photoresist technology. With a total of four patents to her name, Kobayashi has significantly advanced the methods used in semiconductor fabrication.
Latest Patents
Among her most notable inventions is a positive photoresist composition and process for forming contact holes. This innovative composition includes an alkali-soluble resin, a naphthoquinonediazide group-containing compound, and a solvent. Notably, the compound comprises at least one naphthoquinonediazidesulfonic ester of a polyphenol, characterized by a unique structure of 4 to 6 benzene rings bonded by methylene chains. This technology provides a precise pattern image that aligns closely with mask patterns, effectively eliminating dimple formations in contact hole formation, particularly in applications utilizing the phase-shift method.
Career Highlights
Kobayashi works with Tokyo Ohka Kogyo Co., Ltd., a company well-regarded for its advancements in chemical products used in semiconductor manufacturing. Her expertise in photoresist technology aligns with the company's mission to enhance the efficiency and precision of electronic devices.
Collaborations
Throughout her career, Miki Kobayashi has collaborated with distinguished professionals such as Kousuke Doi and Hidekatsu Kohara. These collaborations have further enriched her contributions to the field, promoting innovation and technical excellence.
Conclusion
Miki Kobayashi's innovative work in photoresist technology is a testament to her dedication and expertise in the realm of semiconductor manufacturing. With her four patents, she continues to influence advancements in the industry, showcasing how innovation can lead to significant improvements in technology.