Mikhail Sluch

Title: Mikhail Sluch: Innovator in Optical Metrology

Introduction

Mikhail Sluch is a notable inventor based in Redmond, Oregon, recognized for his contributions to optical metrology. He has developed innovative technologies that enhance the capabilities of spectral imaging systems. His work is particularly significant in the field of photoluminescence detection.

Latest Patents

Mikhail Sluch holds a patent for an "Optical Metrology System for Spectral Imaging of a Sample." This optical metrology device is capable of detecting any combination of photoluminescence light, specular reflection of broadband light, and scattered light from a line across the width of a sample. The device includes a first light source that produces an illumination line on the sample, and a scanning system that scans an illumination spot across the sample to form this line. A detector collects the photoluminescence light emitted along the illumination line. Additionally, a broadband illumination source may produce a second illumination line on the sample, where the detector collects the broadband illumination reflected along this line. A signal collecting optic focuses the collected light into a line, which is received by an optical conduit that matches the entrance of the detector.

Career Highlights

Mikhail Sluch is currently employed at Nanometrics Inc., where he continues to innovate in the field of optical metrology. His work has contributed to advancements in imaging technologies that are essential for various applications in research and industry.

Collaborations

Mikhail collaborates with Andrzej Buczkowski, working together to push the boundaries of optical metrology and enhance the performance of their technologies.

Conclusion

Mikhail Sluch's contributions to optical metrology exemplify the impact of innovative thinking in technology development. His patent and ongoing work at Nanometrics Inc. highlight his role as a key player in advancing spectral imaging systems.