Company Filing History:
Years Active: 1998-2001
Title: Mikhail Ravkin: Innovator in Semiconductor Cleaning Technologies
Introduction
Mikhail Ravkin is a notable inventor based in Sunnyvale, California. He has made significant contributions to the field of semiconductor cleaning technologies, holding a total of 3 patents. His innovative approaches have enhanced the efficiency and effectiveness of cleaning semiconductor substrates.
Latest Patents
Ravkin's latest patents include an "Apparatus for cleaning semiconductor substrates." This invention describes a cleaning method and apparatus that utilizes very dilute Standard Clean 1 (SC1) for cleaning semiconductor substrates, including silicon wafers. The SC1 is delivered to the core of a brush, where the solution is absorbed and then applied to the substrate. This delivery system ensures that chemical solutions are applied uniformly, reducing the volume of chemicals used during the scrubbing process. The process converts substrate surfaces from a hydrophobic state to a hydrophilic state, which is essential for effectively removing surface contaminants through chemical mechanical brush cleaning.
Career Highlights
Throughout his career, Mikhail Ravkin has worked with several prominent companies, including Ontrak Systems, Inc. and Lam Research Corporation. His experience in these organizations has allowed him to develop and refine his innovative cleaning technologies.
Collaborations
Ravkin has collaborated with notable colleagues such as Diane J. Hymes and Wilbur C. Krusell. These partnerships have contributed to the advancement of his work in semiconductor cleaning technologies.
Conclusion
Mikhail Ravkin's contributions to the field of semiconductor cleaning are noteworthy. His innovative patents and career experiences reflect his commitment to improving cleaning processes in the semiconductor industry.