Company Filing History:
Years Active: 2022
Title: **Mikhail Pylnev – Innovator in Semiconductor Inspection Methods**
Introduction
Mikhail Pylnev is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, most notably through a patent that enhances the inspection methods used for multilayer semiconductor devices.
Latest Patents
Pylnev holds a patent titled "Inspection method for multilayer semiconductor device." This innovative method allows for the investigation of multilayered ensembles within a semiconductor device. By utilizing absorption edges of materials, the method can obtain stratigraphic thickness (ST) maps of each layer, ensuring accurate calibration quality curves. This innovation is crucial in advancing the reliability and efficiency of semiconductor manufacturing and testing.
Career Highlights
Mikhail Pylnev is associated with National Tsing Hua University, where he leverages his expertise in semiconductor technologies. His academic background and professional experiences contribute to his role in shaping advancements in engineering and technology.
Collaborations
Throughout his career, Pylnev has collaborated with talented colleagues, including Tzu-Chien Wei and Duc-Anh Le. These partnerships have fostered a creative environment that encourages groundbreaking research and innovation in the field of semiconductors.
Conclusion
Mikhail Pylnev’s innovative approach to multilayer semiconductor inspection is a testament to his dedication and expertise in the field. As advancements in semiconductor technologies continue to evolve, his contributions, along with those of his collaborators, will play a vital role in driving future innovations.